[1] C.H. Zhang, J.M.K. Macalpine and H. Akiyama, Comments on “Initiation of Pulsed Corona Discharge Under Supercritical Conditions”, IEEE Trans. Plasma Science,Vol. 34, No. 5, pp. 2466, Oct. 2006 [2] C.H. Zhang, S. Katsiki and H. Akiyama, EUV Emission from Gas Discharge Produced Plasmas and Solid Tin as Target, J. Phys. D: Appl. Phys. 38 (2005) 4191-5 [3] C.H. Zhang, S. Katsiki and H. Akiyama, Optimizing Operational Parameters for Z-Pinch EUV Source by Artificial Neural Network, Jap. J. Appl. Phys., Vol. 44, No. 7B, pp. 5544-6, 2005 [4] C.H. Zhang, S. Katsuki, H. Akiyama and D.G Xu, EUV Source Radiated from Pinch Plasma for Semiconductor Manufacturing, IEE Micro & Nano Letter Vol. 1, No. 2, pp. 99-102, Dec. 2006 [5] C.H. Zhang, S. Katsiki and H. Akiyama, High-Power EUV Source for Lithography Using Tin Target, Intl. Journal of Nanoscience, Vol. 5, No. 6 (2006) 677-682 [6] J.M.K. MacAlpine and C.H. Zhang, Observations from Measurements of the Furfural Content of Transmission Transformers, Electrical Power Systems Research, 57, 3, pp. 173-179, 2001 [7] C.H. Zhang and J.M.K. MacAlpine, A Phase-related Investigation of AC Corona in Air, IEEE Trans. on DEI, Vol. 10, No. 2, pp. 312-319, April 2003 [8] J.M.K. MacAlpine and C.H. Zhang, The Effect of Humidity on the Charge/Phase-angle Patterns of AC Corona Pulses in Air, IEEE Trans. on DEI, Vol. 10, No. 3, pp. 506-513, June 2003 [1] C.H. Zhang, J.M.K. Macalpine and H. Akiyama, Comments on “Initiation of Pulsed Corona Discharge Under Supercritical Conditions”, IEEE Trans. Plasma Science,Vol. 34, No. 5, pp. 2466, Oct. 2006 [2] C.H. Zhang, S. Katsiki and H. Akiyama, EUV Emission from Gas Discharge Produced Plasmas and Solid Tin as Target, J. Phys. D: Appl. Phys. 38 (2005) 4191-5 [3] C.H. Zhang, S. Katsiki and H. Akiyama, Optimizing Operational Parameters for Z-Pinch EUV Source by Artificial Neural Network, Jap. J. Appl. Phys., Vol. 44, No. 7B, pp. 5544-6, 2005 [4] C.H. Zhang, S. Katsuki, H. Akiyama and D.G Xu, EUV Source Radiated from Pinch Plasma for Semiconductor Manufacturing, IEE Micro & Nano Letter Vol. 1, No. 2, pp. 99-102, Dec. 2006 [5] C.H. Zhang, S. Katsiki and H. Akiyama, High-Power EUV Source for Lithography Using Tin Target, Intl. Journal of Nanoscience, Vol. 5, No. 6 (2006) 677-682 [6] J.M.K. MacAlpine and C.H. Zhang, Observations from Measurements of the Furfural Content of Transmission Transformers, Electrical Power Systems Research, 57, 3, pp. 173-179, 2001 [7] C.H. Zhang and J.M.K. MacAlpine, A Phase-related Investigation of AC Corona in Air, IEEE Trans. on DEI, Vol. 10, No. 2, pp. 312-319, April 2003 [8] J.M.K. MacAlpine and C.H. Zhang, The Effect of Humidity on the Charge/Phase-angle Patterns of AC Corona Pulses in Air, IEEE Trans. on DEI, Vol. 10, No. 3, pp. 506-513, June 2003 |